Join the nanoInk network partner KRÜSS for the final webinar in this three-part series the partners at Lewis University and Keleher Research Group.
In this section, KRÜSS will examine how surface science tools can help guide the development of more sustainable CMP and post-CMP cleaning processes. The discussion will center on how greener chemistries can be evaluated not only by their environmental benefits, but also by their ability to maintain strong surface performance, effective cleaning, and low defectivity.
Webinar details:
- Date: Wednesday, September 16, 2026
- Timeslot: 10 am CDT (3 pm UTC | 5 pm CEST) (Americas & EMEA)
- Language: English
- Duration: Approx. 1 hour, including a Q&A session
- Presenter: Dr. Jason J. Keleher (Lewis University)
Can't make it? Register anyway to receive a copy of the recording.
Register now: https://visit.kruss-scientific.com/webinar/imagining-a-more-sustainable-cmp-and-p-cmp-future-semicon-3
What you will learn during the webinar:
- How surface science can support the design of more sustainable CMP and p-CMP chemistries
- How the DSA100W can be used to compare wettability and surface energy across conventional and greener formulations
- How the DFA100 can help evaluate foam and bubble behavior when screening sustainable chemistries
- How to balance environmental goals with polishing performance, cleaning efficiency, and defect control
- How substrate surface characteristics influence particle adhesion and removal in p-CMP cleaning